Selective Aluminum Chemical Vapor Deposition Using DMEAA

Shangzhu Sun; Mei‐Hui Tsai; HT Chiu; Seog-Woo Yang

doi:10.7567/ssdm.1994.pd-1-1

ScienceGate Book Chapters

JOURNAL ARTICLE

Selective Aluminum Chemical Vapor Deposition Using DMEAA

Shangzhu Sun Mei‐Hui Tsai HT Chiu Seog-Woo Yang

Year: 1994

DOI: 10.7567/ssdm.1994.pd-1-1

Get Full-Text PDF Get Analytical Report

Keywords:

Materials science Chemical vapor deposition Aluminium Deposition (geology) Nanotechnology Combustion chemical vapor deposition Physical vapor deposition Chemical engineering Optoelectronics Metallurgy Thin film Carbon film

Metrics

Cited By

0.00

FWCI (Field Weighted Citation Impact)

Refs

0.31

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Topics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Aluminum Alloy Microstructure Properties

Physical Sciences → Engineering → Aerospace Engineering

Catalytic Processes in Materials Science

Physical Sciences → Materials Science → Materials Chemistry

Selective Aluminum Chemical Vapor Deposition Using DMEAA

Metrics

Topics

Related Documents

Selective aluminum chemical vapor deposition

Selective Chemical Vapor Deposition of Aluminum

Selective Area Chemical Vapor Deposition of Aluminum Using Dimethylethylamine Alane

Selective Chemical Vapor Deposition

Investigation of reaction mechanisms in the chemical vapor deposition of al from DMEAA