JOURNAL ARTICLE
Fabrication of Hollow High Aspect Ratio Metal Microstructure Arrays
Jeffrey M. CalvertJacque H. GeorgerMilton RebbertMark A. AndersonD. ParkJames J. HickmanCharles S. DulceyM. Peckerar
Year: 1992 Journal: MRS Proceedings Vol: 260 Publisher: Cambridge University Press
Keywords:
Photoresist Materials science Resist Microstructure Fabrication Lithography Aspect ratio (aeronautics) Deposition (geology) Substrate (aquarium) Composite material Characterization (materials science) Metal Nanotechnology Optics Optoelectronics Metallurgy Layer (electronics)
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0.00
FWCI (Field Weighted Citation Impact)
6
Refs
0.28
Citation Normalized Percentile
Is in top 1%
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Topics
Polydiacetylene-based materials and applications
Physical Sciences → Chemistry → Organic Chemistry
Photonic Crystals and Applications
Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics
Nanofabrication and Lithography Techniques
Physical Sciences → Engineering → Biomedical Engineering
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