High aspect ratio aligned multilayer microstructure fabrication

Abstract

This paper presents a technique for fabricating precisely aligned high aspect ratio multilayer microstructures based on anodic bonding of silicon and PyrexTM glass. The process involves stacking alternate silicon substrates containing patterns in two dimensions with thin Pyrex glass spacers to form tall three-dimensional structures. The methods used for accurately aligning the layers by optical microscopy and for bonding the layers anodically are described. The application of this technique for building fully functional microlenses for electron-beam microcolumns is presented.