Optical and Structural Characterization of TiO2/SiO2 Multilayer Films Prepared by Helicon Plasma Sputtering.

Abstract

Alternating TiO2/SiO2 multilayer optical films were fabricated on BK7 glass and Si (100) substrates by helicon plasma sputtering at room temperature. Optical and structural characterization of monolayers of TiO2 and SiO2 films, and their multilayers have been performed. The results of structural analysis show that the TiO2 and SiO2 films have a homogeneous and amorphous microstructure. Auger electron spectroscopy (AES) and transmission electron microscopy (TEM) observations reveal that TiO2/SiO2 multilayer films have well-defined interface. Five layers of alternating TiO2 and SiO2 exhibit maximum reflectance of 87% around the central wavelength of 800 nm which agrees well with the theoretical result.