STRUCTURAL AND MAGNETIC PROPERTIES OF FE/SI MULTILAYER GROWN BY HELICON PLASMA SPUTTERING

Abstract

STRUCTURAL AND MAGNETIC PROPERTIES OF FE/SI MULTILAYER GROWN BY HELICON PLASMA SPUTTERING . Helicon plasma sputtering method has been used to grown the Fe/Si multilayer (MLs) with various thickness of Silicon spacer around 0.5 ~ 2nm for Fe thickness fixed at 2nm in order to investigated the antiferromagnetic coupling behaviour. Also we grown the MLs with various Fe thickness around 2-5nm for Silicon spacer fixed at t Si =l nm and l.5nm. Present study found that in case of Silicon spacer thickness t Si = l nm multilayer film exhibit antiferromagnetically ordering, beside this thickness the MLs are ferromagnetic. The maximum magnetoresistance ratio is 0.22%, it appears at the Fe thickness t Fe =3nm and Si thickness t Si =l nm.