Microstructure and optical properties of amorphous TiO2-SiO2 composite films synthesized by helicon plasma sputtering

Xinrong Wang; Hiroshi Masumoto; Yoshihiro Someno; Toshio Hirai

doi:10.1016/s0040-6090(98)01007-4

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JOURNAL ARTICLE

Microstructure and optical properties of amorphous TiO2-SiO2 composite films synthesized by helicon plasma sputtering

Xinrong Wang Hiroshi Masumoto Yoshihiro Someno Toshio Hirai

Year: 1999 Journal: Thin Solid Films Vol: 338 (1-2)Pages: 105-109 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(98)01007-4

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Keywords:

Helicon Materials science Composite number Amorphous solid Microstructure Transmittance Sputtering Refractive index Composite material Substrate (aquarium) Optics Thin film Analytical Chemistry (journal) Plasma Optoelectronics Nanotechnology Chemistry Crystallography

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Topics

Phase-change materials and chalcogenides

Physical Sciences → Materials Science → Materials Chemistry

Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

Nonlinear Optical Materials Studies

Physical Sciences → Engineering → Biomedical Engineering

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