Low temperature atomic layer deposition of titania thin films

Gerry Triani; Jonathan A. Campbell; P. J. Evans; Joel Davis; Bruno A. Latella; R.P. Burford

doi:10.1016/j.tsf.2009.09.010

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Low temperature atomic layer deposition of titania thin films

Gerry Triani Jonathan A. Campbell P. J. Evans Joel Davis Bruno A. Latella R.P. Burford

Year: 2009 Journal: Thin Solid Films Vol: 518 (12)Pages: 3182-3189 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2009.09.010

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Keywords:

Contact angle Quartz crystal microbalance Polycarbonate Materials science Wetting Thin film Layer (electronics) Deposition (geology) Silicon Quartz Atomic layer deposition Composite material Adhesion Chemical engineering Nanotechnology Chemistry Optoelectronics Organic chemistry

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

TiO2 Photocatalysis and Solar Cells

Physical Sciences → Energy → Renewable Energy, Sustainability and the Environment

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Low temperature atomic layer deposition of titania thin films

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