Atomic layer deposition of B2O3 thin films at room temperature

Matti Putkonen; Lauri Niinistö

doi:10.1016/j.tsf.2006.03.001

ScienceGate Book Chapters

JOURNAL ARTICLE

Atomic layer deposition of B2O3 thin films at room temperature

Matti Putkonen Lauri Niinistö

Year: 2006 Journal: Thin Solid Films Vol: 514 (1-2)Pages: 145-149 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2006.03.001

Get Full-Text PDF Get Analytical Report

Keywords:

Elastic recoil detection Overlayer Crystallinity Amorphous solid Thin film Stoichiometry Materials science Analytical Chemistry (journal) Boron Atomic layer deposition Oxide Layer (electronics) Deposition (geology) Carbon film Impurity Pulsed laser deposition Chemistry Crystallography Nanotechnology Metallurgy Composite material Physical chemistry

Metrics

Cited By

2.02

FWCI (Field Weighted Citation Impact)

Refs

0.88

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Atomic layer deposition of B2O3 thin films at room temperature

Metrics

Citation History

Topics

Related Documents

Electron-enhanced atomic layer deposition of silicon thin films at room temperature

Room-temperature bonding of Al2O3 thin films deposited using atomic layer deposition

UV-enhanced atomic layer deposition of ZrO2 thin films at room temperature

Low temperature atomic layer deposition of titania thin films

Toward extended release of metformin by room-temperature atomic layer deposition of thin SiO2 films