Modeling MOCVD Growth of YBCO Thin Films

Tak Shing Lo; Robert V. Kohn

doi:10.1557/proc-648-p6.49

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Modeling MOCVD Growth of YBCO Thin Films

Tak Shing Lo Robert V. Kohn

Year: 2000 Journal: MRS Proceedings Vol: 648 Publisher: Cambridge University Press

DOI: 10.1557/proc-648-p6.49

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Keywords:

Materials science Metalorganic vapour phase epitaxy Chemical vapor deposition Thin film Deposition (geology) Spiral (railway) Coupling (piping) Combustion chemical vapor deposition Nanotechnology Engineering physics Optoelectronics Layer (electronics) Carbon film Composite material Epitaxy Mechanical engineering

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Solidification and crystal growth phenomena

Physical Sciences → Materials Science → Materials Chemistry

Physics of Superconductivity and Magnetism

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Crystallization and Solubility Studies

Physical Sciences → Materials Science → Materials Chemistry

Modeling MOCVD Growth of YBCO Thin Films

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