Low-pressure single aerosol source MOCVD of YBCO thin films

W. Decker; Y.Y. Erokhin; O. Yu. Gorbenko; I. E. Graboy; A. R. Kaul; A. Nürnberg; M. Pulver; R. Stollé; G. Wahl

doi:10.1016/0925-8388(93)90742-6

ScienceGate Book Chapters

JOURNAL ARTICLE

Low-pressure single aerosol source MOCVD of YBCO thin films

W. Decker Y.Y. Erokhin O. Yu. Gorbenko I. E. Graboy A. R. Kaul A. Nürnberg M. Pulver R. Stollé G. Wahl

Year: 1993 Journal: Journal of Alloys and Compounds Vol: 195 Pages: 291-294 Publisher: Elsevier BV

DOI: 10.1016/0925-8388(93)90742-6

Get Full-Text PDF Get Analytical Report

Keywords:

Metalorganic vapour phase epitaxy Thin film Chemical vapor deposition Materials science Partial pressure Aerosol Deposition (geology) Atmospheric pressure Process (computing) Carbon dioxide Mineralogy Composite material Optoelectronics Nanotechnology Chemistry Epitaxy Meteorology Geology Computer science Layer (electronics) Oxygen Organic chemistry

Metrics

Cited By

1.69

FWCI (Field Weighted Citation Impact)

Refs

0.82

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Phase Equilibria and Thermodynamics

Physical Sciences → Engineering → Biomedical Engineering

Catalytic Processes in Materials Science

Physical Sciences → Materials Science → Materials Chemistry

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Low-pressure single aerosol source MOCVD of YBCO thin films

Metrics

Citation History

Topics

Related Documents

X-ray diffraction analysis of YBCO thin films synthesized by aerosol MOCVD

Low pressure MOCVD of TiN thin films

Modeling MOCVD Growth of YBCO Thin Films

Single source MOCVD of epitaxial oxide thin films

Single-source MOCVD of binary alloy CoSn thin films