Single source MOCVD of epitaxial oxide thin films

R. Hiskes; Steve DiCarolis; R. D. Jacowitz; Zhenda Lu; Robert S. Feigelson; R. K. Route; James L. Young

doi:10.1016/s0022-0248(07)80044-3

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Single source MOCVD of epitaxial oxide thin films

R. Hiskes Steve DiCarolis R. D. Jacowitz Zhenda Lu Robert S. Feigelson R. K. Route James L. Young

Year: 1993 Journal: Journal of Crystal Growth Vol: 128 (1-4)Pages: 781-787 Publisher: Elsevier BV

DOI: 10.1016/s0022-0248(07)80044-3

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Keywords:

Metalorganic vapour phase epitaxy Materials science Yttrium Chemical vapor deposition Heterojunction Epitaxy Oxide Thin film Barium Dielectric Mineralogy Optoelectronics Nanotechnology Chemistry Metallurgy Layer (electronics)

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Physics of Superconductivity and Magnetism

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Single source MOCVD of epitaxial oxide thin films

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