Three-dimensional holographic lithography by an iterative algorithm

Abstract

We have applied an iterative algorithm for hologram design with multiple output image planes arranged in close proximity to create continuous patterns within an imaging volume. These holograms have been designed for photolithography on three-dimensional surfaces. The influence of simulated image plane separation on the final image, and its suitability for lithography, is assessed. Results are presented and the most suitable case is demonstrated experimentally.