JOURNAL ARTICLE

Analysis of interface electronic structure in InxGa1−xN/GaN heterostructures

H. ZhangEric J MillerEdward T. YuC. PoblenzJames S. Speck

Year: 2004 Journal:   Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena Vol: 22 (4)Pages: 2169-2174   Publisher: American Institute of Physics

Abstract

Capacitance–voltage profiling was used to measure interfacial polarization charge densities and conduction-band offsets at InxGa1−xN/GaN heterojunction interfaces for x=0.054 and 0.09. A variant of the conventional analysis technique used to deduce interface charge density and band-offset values from capacitance–voltage data was developed and applied. Conduction-band offsets of 0.09±0.07 and 0.22±0.05 eV are obtained for x=0.054 and 0.09, respectively. Polarization charge densities derived from these measurements are (1.80±0.32)×1012 and (4.38±0.36)×1012 e/cm2 for x=0.054 and 0.09, respectively. These values are somewhat lower than those predicted theoretically, but are in good agreement with values inferred from a substantial body of optical data reported for InxGa1−xN/GaN quantum-well structures.

Keywords:
Heterojunction Capacitance Conduction band Materials science Band offset Charge density Polarization (electrochemistry) Optoelectronics Electronic band structure Wide-bandgap semiconductor Condensed matter physics Band gap Electron Chemistry Valence band Physics

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24
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0.72
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Citation History

Topics

GaN-based semiconductor devices and materials
Physical Sciences →  Physics and Astronomy →  Condensed Matter Physics
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Ga2O3 and related materials
Physical Sciences →  Materials Science →  Electronic, Optical and Magnetic Materials

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