Chemical Vapor Deposition of Titania/Silica and Zirconia Films

Wayne L. Gladfelter; Ryan C. Smith; David J. Burleson; C. James Taylor; Jeffrey T. Roberts; Stephen A. Campbell; Noel Hoilien; Mike Tiner; Rama I. Hegde; C. Hobbs

doi:10.1557/proc-670-k4.1

JOURNAL ARTICLE

Chemical Vapor Deposition of Titania/Silica and Zirconia Films

Wayne L. Gladfelter Ryan C. Smith David J. Burleson C. James Taylor Jeffrey T. Roberts Stephen A. Campbell Noel Hoilien Mike Tiner Rama I. Hegde C. Hobbs

Year: 2001 Journal: MRS Proceedings Vol: 670 Publisher: Cambridge University Press

DOI: 10.1557/proc-670-k4.1

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Keywords:

Materials science Scanning electron microscope Amorphous solid Chemical vapor deposition Cubic zirconia Thin film Zirconium Analytical Chemistry (journal) Transmission electron microscopy Substrate (aquarium) Chemical engineering Crystallography Nanotechnology Composite material Metallurgy Chemistry Organic chemistry Ceramic

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Catalytic Processes in Materials Science

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Chemical Vapor Deposition of Titania/Silica and Zirconia Films

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