High-Speed Deposition of Yttria-Stabilized Zirconia and Titania Films by Laser Chemical Vapor Deposition

Abstract

Yttria-stabilized zirconia (YSZ, Zr1-xYxO2-x/2) and titania (TiO2) films were prepared by laser chemical vapor deposition (LCVD). The deposition rate increased drastically by laser irradiation, and reached to 660 μm/h for YSZ and 2300 μm/h for TiO2 films. The increase of the deposition rate was resulted from plasma formation around the deposition zone, and the plasma was formed at high laser power and high substrate pre-heating temperature. Various morphologies of films such as feather-like columnar structure and dense microstructure were obtained depending on deposition conditions. The columnar structure contained a large amount of nano-pores at columnar boundary and in grains.