Permittivity characterization of low-k thin films from transmission-line measurements

Abstract

Developed a broad-band technique for measuring the relative permittivity of low-k thin films using microstrip transmission-line measurements. From measurements of the complex microstrip propagation constant and the characteristic impedance, we determined the relative permittivity of thin films incorporated in microstrip lines. We present measurement results to 40 GHz for both an oxide and a bisbenzocyclobutene low-k thin film and show a variability of permittivity of approximately /spl plusmn/5% over the entire frequency range.