Permittivity characterization from open‐end microstrip line measurements

Abstract

Abstract A broad‐band method for measuring the complex permittivity of isotropic film‐shaped materials at low microwave frequencies is presented. The characterized material is the substrate of an open‐end microstrip line used as sample‐cell. Complex permittivity is computed from S 11 reflection parameter measurement of open‐end microstrip cell using analytical relationships, which decrease the computation time. Vector network analyzer and high‐quality on‐microstrip test fixture are used for the measurement bench. Measurements over 0.01 GHz–3 GHz frequency range with several nonmagnetic materials show good agreements between measured and predicted results. © 2007 Wiley Periodicals, Inc. Microwave Opt Technol Lett 49: 1371–1374, 2007; Published online in Wiley InterScience (www.interscience.wiley.com). DOI 10.1002/mop.22410