Wavelength-Dependent Area Selectivity in Photochemical Vapor Deposition of Aluminum Films

Mitsugu Hanabusa; Masashi Ikeda

doi:10.1557/proc-158-135

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Wavelength-Dependent Area Selectivity in Photochemical Vapor Deposition of Aluminum Films

Mitsugu Hanabusa Masashi Ikeda

Year: 1989 Journal: MRS Proceedings Vol: 158 Publisher: Cambridge University Press

DOI: 10.1557/proc-158-135

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Keywords:

Materials science Nucleation Selectivity Wavelength Substrate (aquarium) Deposition (geology) Photochemistry Aluminium Silicon Thin film Chemical vapor deposition Optoelectronics Nanotechnology Catalysis Chemistry Composite material

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Ion-surface interactions and analysis

Physical Sciences → Engineering → Computational Mechanics

Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Wavelength-Dependent Area Selectivity in Photochemical Vapor Deposition of Aluminum Films

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