Photochemical Vapor Deposition of Aluminum Thin Films

Mitsugu Hanabusa; Akira Oikawa; Peng Cai; Shigeo Furuno; Satoshi Iguchi

doi:10.1557/proc-129-73

ScienceGate Book Chapters

JOURNAL ARTICLE

Photochemical Vapor Deposition of Aluminum Thin Films

Mitsugu Hanabusa Akira Oikawa Peng Cai Shigeo Furuno Satoshi Iguchi

Year: 1988 Journal: MRS Proceedings Vol: 129 Publisher: Cambridge University Press

DOI: 10.1557/proc-129-73

Get Full-Text PDF Get Analytical Report

Keywords:

Materials science Pulsed laser deposition Thin film Substrate (aquarium) Aluminium Deposition (geology) Laser Hydride Electrical resistivity and conductivity Chemical vapor deposition Photodissociation Analytical Chemistry (journal) Photochemistry Optoelectronics Optics Nanotechnology Metal Composite material Metallurgy Chemistry

Metrics

Cited By

0.00

FWCI (Field Weighted Citation Impact)

Refs

0.28

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Topics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Molecular Junctions and Nanostructures

Physical Sciences → Engineering → Electrical and Electronic Engineering

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Photochemical Vapor Deposition of Aluminum Thin Films

Metrics

Topics

Related Documents

Photochemical Vapor Deposition of Aluminum Thin Films Using Dimethylaluminum Hydride

Chemical Vapor Deposition of Aluminum Oxide Thin Films

Chemical vapor deposition of aluminum nitride thin films

Deposition of aluminum thin films by photochemical surface reaction

Wavelength-Dependent Area Selectivity in Photochemical Vapor Deposition of Aluminum Films