JOURNAL ARTICLE
Growth of Diamond Films by Microwave Plasma Chemical Vapor Deposition
Gao KelinChunlin WangRu-Juan ZhanDingkun PengMeng GuangyaoXiang Zhilin
Year: 1991 Journal: Chinese Physics Letters Vol: 8 (7)Pages: 348-351 Publisher: Institute of Physics
Abstract
Diamond thin films were produced by microwave plasma chemical vapor deposition. The deposit is identified by x-ray diffraction, Raman spectroscopy and Scanning electron microscopy. During the course of diamond growth, the characteristics of the plasma have been measured by means of the Langmuir double probe and emission spectrometer.
Keywords:
Chemical vapor deposition Diamond Raman spectroscopy Materials science Carbon film Plasma Analytical Chemistry (journal) Microwave Scanning electron microscope Langmuir probe Ion source Thin film Plasma-enhanced chemical vapor deposition Deposition (geology) Combustion chemical vapor deposition Optics Plasma diagnostics Optoelectronics Nanotechnology Chemistry Composite material Physics Environmental chemistry
Metrics
3
Cited By
0.71
FWCI (Field Weighted Citation Impact)
3
Refs
0.70
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Diamond and Carbon-based Materials Research
Physical Sciences → Materials Science → Materials Chemistry
Metal and Thin Film Mechanics
Physical Sciences → Engineering → Mechanics of Materials
Force Microscopy Techniques and Applications
Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics
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