JOURNAL ARTICLE

Deposition of II‐VI Thin Films by LP‐MOCVD Using Novel Single‐Source Precursors

Abstract

Abstract Thin films of several zinc or cadmium chalcogenides have been deposited on glass substrates by low pressure metal‐organic chemical vapour deposition (LP‐MOCVD) using single‐source precursors, [M{(EP i Pr 2 ) 2 N} 2 ] (M = Cd II , Zn II and E = S, Se). X‐ray single crystal structures show that [Zn{(EP i Pr 2 ) 2 N} 2 ] (E = S or Se) and [Zn{(SePPh 2 ) 2 N} 2 ] are tetrahedrally distorted. TGA analyses showed that the precursors are volatile, making them suitable for MOCVD studies. As‐deposited films were polycrystalline as confirmed by X‐ray powder diffraction (XRPD) and their morphologies were studied by scanning electron microscope (SEM). (© Wiley‐VCH Verlag GmbH & Co. KGaA, 69451 Weinheim, Germany, 2004)

Keywords:
Metalorganic vapour phase epitaxy Chemistry Chemical vapor deposition Scanning electron microscope Crystallite Single crystal Thin film Zinc Cadmium Powder diffraction Analytical Chemistry (journal) Metal Deposition (geology) Crystallography Nanotechnology Materials science Organic chemistry Layer (electronics)

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Citation History

Topics

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