A single source approach to deposition of nickel sulfide thin films by LP-MOCVD

Paul O’Brien; J.H. Park; Jonathan M. Waters

doi:10.1016/s0040-6090(03)00244-x

ScienceGate Book Chapters

JOURNAL ARTICLE

A single source approach to deposition of nickel sulfide thin films by LP-MOCVD

Paul O’Brien J.H. Park Jonathan M. Waters

Year: 2003 Journal: Thin Solid Films Vol: 431-432 Pages: 502-505 Publisher: Elsevier BV

DOI: 10.1016/s0040-6090(03)00244-x

Get Full-Text PDF Get Analytical Report

Keywords:

Metalorganic vapour phase epitaxy Nickel sulfide Thin film Nickel Scanning electron microscope Chemical vapor deposition Sulfide Deposition (geology) Analytical Chemistry (journal) Materials science Carbon film Transition metal Chemistry Chemical engineering Nanotechnology Metallurgy Epitaxy Catalysis Composite material Organic chemistry

Metrics

Cited By

1.25

FWCI (Field Weighted Citation Impact)

Refs

0.81

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Chalcogenide Semiconductor Thin Films

Physical Sciences → Engineering → Electrical and Electronic Engineering

Quantum Dots Synthesis And Properties

Physical Sciences → Materials Science → Materials Chemistry

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

A single source approach to deposition of nickel sulfide thin films by LP-MOCVD

Metrics

Citation History

Topics

Related Documents

A Single Source Approach To Deposition Of Nickel and Palladium Sulfide Thin Films By LP-MOCVD

Deposition of II‐VI Thin Films by LP‐MOCVD Using Novel Single‐Source Precursors

Single source MOCVD of epitaxial oxide thin films

Deposition of iron sulfide thin films by AACVD from single source precursors

Selective Deposition of Cobalt Sulfide Nanostructured Thin Films from Single-Source Precursors