Single and dual-mode plasma enhanced chemical vapor deposition of fluorinated diamond-like carbon films

Seyed Iman Hosseini; M Sharifian; Babak Shokri

doi:10.1016/j.surfcoat.2012.10.072

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Single and dual-mode plasma enhanced chemical vapor deposition of fluorinated diamond-like carbon films

Seyed Iman Hosseini M Sharifian Babak Shokri

Year: 2012 Journal: Surface and Coatings Technology Vol: 213 Pages: 285-290 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2012.10.072

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Keywords:

Materials science Chemical vapor deposition Analytical Chemistry (journal) Contact angle Raman spectroscopy Carbon film Plasma-enhanced chemical vapor deposition Surface roughness Fluorine Carbon fibers Thin film Nanotechnology Optics Composite material Chemistry Composite number Organic chemistry Metallurgy

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Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Graphene research and applications

Physical Sciences → Materials Science → Materials Chemistry

Single and dual-mode plasma enhanced chemical vapor deposition of fluorinated diamond-like carbon films

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