Dual frequency plasma enhanced chemical vapor deposition of diamond like carbon

Abstract

Summary form only given: Diamond like carbon (DLC) is deposited by dual frequency PECVD. It consists of a surface wave coupled microwave (MW) at 2.45 GHz and capacitively coupled radio frequency (RF) at 34 MHz. By using this method in addition to depositing DLC films at low temperature, we can control key parameters of the system independently. These parameters are the energy of ions reaching on the surface and the density of radicals and ions. We uses CH4 and H2 which the former is injected to the RF part and hydrogen plasma is produced by MW section. SEM and AFM are used to ascertaining the quality of the films.