R.F. sputtered β-tantalum and b.c.c. tantalum films

Andrew J. Schauer; M. Roschy

doi:10.1016/0040-6090(72)90095-8

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R.F. sputtered β-tantalum and b.c.c. tantalum films

Andrew J. Schauer M. Roschy

Year: 1972 Journal: Thin Solid Films Vol: 12 (2)Pages: 313-317 Publisher: Elsevier BV

DOI: 10.1016/0040-6090(72)90095-8

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Keywords:

Tantalum Sputtering Partial pressure Analytical Chemistry (journal) Temperature coefficient Argon Tetragonal crystal system Materials science Electrical resistivity and conductivity Nitrogen Phase (matter) Oxygen Atmospheric temperature range Stoichiometry Chemistry Thin film Crystallography Metallurgy Composite material Nanotechnology Physical chemistry Thermodynamics

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

R.F. sputtered β-tantalum and b.c.c. tantalum films

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