JOURNAL ARTICLE
Characterization of reactively r.f.-sputtered tantalum oxide films
Yuan‐Kuang TuChia-Chien LinWay‐Seen WangSheng-Liang Huang
Year: 1988 Journal: Thin Solid Films Vol: 162 Pages: 325-331 Publisher: Elsevier BV
Keywords:
Tantalum Sputtering Refractive index Substrate (aquarium) Analytical Chemistry (journal) Thin film Deposition (geology) Materials science Oxide Chemistry Metallurgy Nanotechnology Optoelectronics
Metrics
11
Cited By
0.62
FWCI (Field Weighted Citation Impact)
3
Refs
0.66
Citation Normalized Percentile
Is in top 1%
Is in top 10%
Citation History
Topics
Metal and Thin Film Mechanics
Physical Sciences → Engineering → Mechanics of Materials
Semiconductor materials and devices
Physical Sciences → Engineering → Electrical and Electronic Engineering
Copper Interconnects and Reliability
Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials
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