R.f. sputtered tantalum films deposited in an oxygen doped atmosphere

P.N. Baker

doi:10.1016/0040-6090(70)90090-8

ScienceGate Book Chapters

JOURNAL ARTICLE

R.f. sputtered tantalum films deposited in an oxygen doped atmosphere

P.N. Baker

Year: 1970 Journal: Thin Solid Films Vol: 6 (5)Pages: R57-R60 Publisher: Elsevier BV

DOI: 10.1016/0040-6090(70)90090-8

Get Full-Text PDF Get Analytical Report

Keywords:

Tantalum Doping Oxygen Atmosphere (unit) Materials science Sputtering Thin film Metallurgy Chemistry Nanotechnology Optoelectronics Physics Meteorology

Metrics

Cited By

6.77

FWCI (Field Weighted Citation Impact)

Refs

0.97

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

High-Temperature Coating Behaviors

Physical Sciences → Engineering → Aerospace Engineering

R.f. sputtered tantalum films deposited in an oxygen doped atmosphere

Metrics

Citation History

Topics

Related Documents

Comments on “R.F. sputtered tantalum films deposited in an oxygen doped atmosphere”

Reply to “comments on R.F. sputtered tantalum films deposited in an oxygen doped atmosphere”

R.F. sputtered β-tantalum and b.c.c. tantalum films

Characterization of reactively r.f.-sputtered tantalum oxide films

Structure and properties of r.f. sputtered, superconducting tantalum films