JOURNAL ARTICLE

Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

Keywords:
Electron cyclotron resonance Silicon nitride Analytical Chemistry (journal) Thin film Chemical vapor deposition Materials science Fourier transform infrared spectroscopy Ellipsometry Etching (microfabrication) Plasma-enhanced chemical vapor deposition Raman spectroscopy Nitride Silicon Chemistry Nanotechnology Optoelectronics Chemical engineering Optics

Metrics

11
Cited By
2.00
FWCI (Field Weighted Citation Impact)
22
Refs
0.88
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
ZnO doping and properties
Physical Sciences →  Materials Science →  Materials Chemistry
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