Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

C. Biasotto; J. A. Diniz; A. M. Daltrini; Stanislav A. Moshkalev; M. J. R. Monteiro

doi:10.1016/j.tsf.2008.03.010

ScienceGate Book Chapters

JOURNAL ARTICLE

Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

C. Biasotto J. A. Diniz A. M. Daltrini Stanislav A. Moshkalev M. J. R. Monteiro

Year: 2008 Journal: Thin Solid Films Vol: 516 (21)Pages: 7777-7782 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2008.03.010

Get Full-Text PDF Get Analytical Report

Keywords:

Electron cyclotron resonance Silicon nitride Analytical Chemistry (journal) Thin film Chemical vapor deposition Materials science Fourier transform infrared spectroscopy Ellipsometry Etching (microfabrication) Plasma-enhanced chemical vapor deposition Raman spectroscopy Nitride Silicon Chemistry Nanotechnology Optoelectronics Chemical engineering Optics

Metrics

Cited By

2.00

FWCI (Field Weighted Citation Impact)

Refs

0.88

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Silicon nitride thin films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition for micromechanical system applications

Metrics

Citation History

Topics

Related Documents

Silicon nitride thin films deposited by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Electron cyclotron resonance plasma chemical vapor deposited silicon nitride for micromechanical applications

Silicon dioxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition

Wet etching studies of silicon nitride thin films deposited by electron cyclotron resonance (ECR) plasma enhanced chemical vapor deposition

Characterization of Dielectric Silicon Nitride Thin Films Deposited by Radio Frequency Plasma-Enhanced and Electron Cyclotron Resonance Chemical Vapor Deposition