Fundamental optical absorption edge of reactively direct current magnetron sputter-deposited AlN thin films

Abstract

Aita et al. [J. Appl. Phys. 66, 4360 (1989)] studied the ultraviolet optical behavior of rf sputter-deposited AlN thin films. The same optical behavior is found for reactively dc magnetron sputter-deposited AlN thin films at different total gas flows for constant Ar/N2 ratios. The microcrystallites of these films exhibit diameters between 5 and 20 nm.