Direct current magnetron sputter-deposited ZnO thin films

Abstract

Zinc oxide (ZnO) thin films were deposited on glass substrates at room temperature using direct current (DC) magnetron sputtering technique. The deposition pressure was varied from 12 mTorr to 25 mTorr. The influence of the deposition pressure on structural properties of the ZnO films was investigated using atomic force microscopy (AFM). The optical properties of the ZnO films were measured using Ocean Optics spectrometer. The experimental results reveal that the deposition pressure has an important role in the structural and optical properties of the ZnO films.