Reactively sputter-deposited Mo–Ox–Ny thin films

Y.G. Shen; Yiu‐Wing Mai

doi:10.1016/s0921-5107(02)00236-2

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Reactively sputter-deposited Mo–Ox–Ny thin films

Y.G. Shen Yiu‐Wing Mai

Year: 2002 Journal: Materials Science and Engineering B Vol: 95 (3)Pages: 222-229 Publisher: Elsevier BV

DOI: 10.1016/s0921-5107(02)00236-2

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Keywords:

X-ray photoelectron spectroscopy Materials science Thin film Amorphous solid Oxygen Sputter deposition Microstructure Electron diffraction Analytical Chemistry (journal) Sputtering Transmission electron microscopy Annealing (glass) Molybdenum Crystallography Chemical engineering Nanotechnology Composite material Chemistry Diffraction Metallurgy Optics

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Reactively sputter-deposited Mo–Ox–Ny thin films

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