Atomic layer deposition of Al2O3 thin films on diamond

Nobuyuki Kawakami; Yoshihiro Yokota; Takeshi Tachibana; Kazushi Hayashi; Koji Kobashi

doi:10.1016/j.diamond.2005.08.020

ScienceGate Book Chapters

JOURNAL ARTICLE

Atomic layer deposition of Al2O3 thin films on diamond

Nobuyuki Kawakami Yoshihiro Yokota Takeshi Tachibana Kazushi Hayashi Koji Kobashi

Year: 2005 Journal: Diamond and Related Materials Vol: 14 (11-12)Pages: 2015-2018 Publisher: Elsevier BV

DOI: 10.1016/j.diamond.2005.08.020

Get Full-Text PDF Get Analytical Report

Keywords:

Atomic layer deposition Diamond Materials science Thin film Optoelectronics Chemical vapor deposition Field-effect transistor Carbon film Aluminium Layer (electronics) Nanotechnology Transistor Composite material Electrical engineering

Metrics

Cited By

1.29

FWCI (Field Weighted Citation Impact)

Refs

0.82

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Diamond and Carbon-based Materials Research

Physical Sciences → Materials Science → Materials Chemistry

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Atomic layer deposition of Al2O3 thin films on diamond

Metrics

Citation History

Topics

Related Documents

Thermal Stability of Atomic Layer Deposition Al2O3 Thin Films

Nanolaminated Al2O3–TiO2 thin films grown by atomic layer deposition

N-doped Al2O3 thin films deposited by atomic layer deposition

Properties of Al2O3 thin films grown by atomic layer deposition

Atomic layer deposition of Al2O3 thin films using trimethylaluminum and acetone