JOURNAL ARTICLE

Growth processes of RF glow discharge deposited a-Si:H and a-Ge:H films

A. M. AntoineB. DrévillonPere RocaI. Cabarrocas

Year: 1985 Journal:   Journal of Non-Crystalline Solids Vol: 77-78 Pages: 769-772   Publisher: Elsevier BV
Keywords:
Torr Glow discharge Materials science Analytical Chemistry (journal) Deposition (geology) Ellipsometry Ion Homogeneous Thin film Plasma Chemistry Nanotechnology

Metrics

33
Cited By
4.18
FWCI (Field Weighted Citation Impact)
4
Refs
0.95
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Citation History

Topics

Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry
Silicon and Solar Cell Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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