Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering

Stijn Mahieu; Pieter Ghekiere; G. De Winter; Roger De Gryse; Diederik Depla; G. Van Tendeloo; Oleg I. Lebedev

doi:10.1016/j.surfcoat.2004.09.012

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Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering

Stijn Mahieu Pieter Ghekiere G. De Winter Roger De Gryse Diederik Depla G. Van Tendeloo Oleg I. Lebedev

Year: 2004 Journal: Surface and Coatings Technology Vol: 200 (8)Pages: 2764-2768 Publisher: Elsevier BV

DOI: 10.1016/j.surfcoat.2004.09.012

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Keywords:

Materials science Titanium nitride Sputtering Tin Nitride Substrate (aquarium) Texture (cosmology) Sputter deposition Crystallite Composite material Thin film Cavity magnetron Metallurgy Layer (electronics) Nanotechnology

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Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Acoustic Wave Resonator Technologies

Physical Sciences → Engineering → Biomedical Engineering

Biaxially aligned titanium nitride thin films deposited by reactive unbalanced magnetron sputtering

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