Electroplating to visualize defects in Al2O3 thin films grown using atomic layer deposition

Yadong Zhang; Jacob A. Bertrand; Ronggui Yang; Steven M. George; Y.C. Lee

doi:10.1016/j.tsf.2008.12.052

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Electroplating to visualize defects in Al2O3 thin films grown using atomic layer deposition

Yadong Zhang Jacob A. Bertrand Ronggui Yang Steven M. George Y.C. Lee

Year: 2009 Journal: Thin Solid Films Vol: 517 (11)Pages: 3269-3272 Publisher: Elsevier BV

DOI: 10.1016/j.tsf.2008.12.052

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Keywords:

Atomic layer deposition Electroplating Thin film Materials science Copper Layer (electronics) Surface modification Nickel Nanotechnology Optoelectronics Chemical engineering Metallurgy

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Electronic and Structural Properties of Oxides

Physical Sciences → Materials Science → Materials Chemistry

Electroplating to visualize defects in Al2O3 thin films grown using atomic layer deposition

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