High-energy Electron Beam Irradiation of Al-doped ZnO Thin Films Deposited at Room Temperature

Eui‐Jung Yun; Jin Jung; Jong-Ha Hwang; Byung Cheol Lee; Myunghee Jung

doi:10.3938/jkps.58.555

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High-energy Electron Beam Irradiation of Al-doped ZnO Thin Films Deposited at Room Temperature

Eui‐Jung Yun Jin Jung Jong-Ha Hwang Byung Cheol Lee Myunghee Jung

Year: 2011 Journal: Journal of the Korean Physical Society Vol: 58 (3(1))Pages: 555-559 Publisher: Springer Science+Business Media

DOI: 10.3938/jkps.58.555

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Keywords:

Materials science Irradiation Doping Electron beam processing Thin film Optoelectronics Cathode ray Electron Nanotechnology Physics Nuclear physics

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

GaN-based semiconductor devices and materials

Physical Sciences → Physics and Astronomy → Condensed Matter Physics

Ga2O3 and related materials

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

High-energy Electron Beam Irradiation of Al-doped ZnO Thin Films Deposited at Room Temperature

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