Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering

Steffen Jäger; Bernd Szyszka; J. Szczyrbowski; Günter Bräuer

doi:10.1016/s0257-8972(97)00145-x

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Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering

Steffen Jäger Bernd Szyszka J. Szczyrbowski Günter Bräuer

Year: 1998 Journal: Surface and Coatings Technology Vol: 98 (1-3)Pages: 1304-1314 Publisher: Elsevier BV

DOI: 10.1016/s0257-8972(97)00145-x

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Keywords:

Materials science Dopant Thin film Sputtering Analytical Chemistry (journal) Sputter deposition Electrical resistivity and conductivity Transparent conducting film Doping Tin oxide Cavity magnetron Optoelectronics Nanotechnology

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ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

Comparison of transparent conductive oxide thin films prepared by a.c. and d.c. reactive magnetron sputtering

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