Characterization of niobium oxide electrochromic thin films prepared by reactive d.c. magnetron sputtering

Kazuki Yoshimura; Takeshi Miki; S. Iwama; Sakae Tanemura

doi:10.1016/0040-6090(96)08640-3

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Characterization of niobium oxide electrochromic thin films prepared by reactive d.c. magnetron sputtering

Kazuki Yoshimura Takeshi Miki S. Iwama Sakae Tanemura

Year: 1996 Journal: Thin Solid Films Vol: 281-282 Pages: 235-238 Publisher: Elsevier BV

DOI: 10.1016/0040-6090(96)08640-3

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Keywords:

Electrochromism Amorphous solid Niobium oxide Auger electron spectroscopy Sputtering Materials science Analytical Chemistry (journal) Niobium Thin film Sputter deposition Oxide Chemistry Metallurgy Nanotechnology Crystallography Electrode

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Transition Metal Oxide Nanomaterials

Physical Sciences → Materials Science → Polymers and Plastics

Gas Sensing Nanomaterials and Sensors

Physical Sciences → Engineering → Electrical and Electronic Engineering

Magneto-Optical Properties and Applications

Physical Sciences → Engineering → Electrical and Electronic Engineering

Characterization of niobium oxide electrochromic thin films prepared by reactive d.c. magnetron sputtering

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