Three dimensional HSQ structures formed using multiple low energy electron beam lithography

E. Boyd; Richard J. Blaikie

doi:10.1016/j.mee.2006.01.253

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Three dimensional HSQ structures formed using multiple low energy electron beam lithography

E. Boyd Richard J. Blaikie

Year: 2006 Journal: Microelectronic Engineering Vol: 83 (4-9)Pages: 767-770 Publisher: Elsevier BV

DOI: 10.1016/j.mee.2006.01.253

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Keywords:

Electron-beam lithography Materials science Hydrogen silsesquioxane Lithography Fabrication Stencil lithography Cathode ray Rod Dielectric Resist Next-generation lithography Electron Optoelectronics Optics Nanotechnology Physics

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Photonic Crystals and Applications

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Optical Coatings and Gratings

Physical Sciences → Materials Science → Surfaces, Coatings and Films

Photonic and Optical Devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Three dimensional HSQ structures formed using multiple low energy electron beam lithography

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