Ultra Thin Al-doped Transparent Conducting Zinc Oxide Films Fabricated by Pulsed Laser Deposition Method
Masataka NakamuraKimihiro IkutaTakanori AokiAkio SuzukiTatsuhiko MatsushitaMasahiro Okuda
Abstract
Approximately 20~110 nm-thick Al-doped transparent conducting zinc oxide (AZO) films have been deposited on glass substrates at temperature of 200~300°C by pulse laser deposition (PLD) using ArF excimer laser (λ=193 nm). When fabricated at the substrate temperature of 260°C, 40 nm-thick AZO films showed the lowest resistivity of 2.61×10-4 Ω•cm.
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