JOURNAL ARTICLE

Characterization of buried silicon-nitride formed by nitrogen implantation

Jürgen BelzE.H. Te KaatG. ZimmerH. Vogt

Year: 1987 Journal:   Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms Vol: 19-20 Pages: 279-284   Publisher: Elsevier BV
Keywords:
Materials science Nucleation Silicon Silicon nitride Crystallization Annealing (glass) Epitaxy Nitride Amorphous solid Nitrogen Crystallography Analytical Chemistry (journal) Metallurgy Layer (electronics) Chemical engineering Composite material Chemistry

Metrics

24
Cited By
5.44
FWCI (Field Weighted Citation Impact)
7
Refs
0.97
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Thin-Film Transistor Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Silicon Nanostructures and Photoluminescence
Physical Sciences →  Materials Science →  Materials Chemistry

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