Transparent conductive indium oxide film deposited on low temperature substrates by activated reactive evaporation

Abstract

High quality conductive coatings for the visible region were prepared on low temperature glass substrates. The conductive layer was an indium oxide film deposited by the activated reactive evaporation technique using a glow discharge hollow cathode ion gun. An antireflective layer of MgF(2) was deposited over the conductive layer. The average transmission in the visible region of the coated glass with sheet resistance of < 15 Omega/sq was greater than 90%. The coating was durable and passed a series of environmental tests according to MIL-C-675C.