Preparation of amorphous fluoride films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Masanori Shojiya; Shuhei Takahashi; Miyuki Teramoto; Akio Konishi; Yoji Kawamoto

doi:10.1016/s0022-3093(01)00395-7

ScienceGate Book Chapters

JOURNAL ARTICLE

Preparation of amorphous fluoride films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Masanori Shojiya Shuhei Takahashi Miyuki Teramoto Akio Konishi Yoji Kawamoto

Year: 2001 Journal: Journal of Non-Crystalline Solids Vol: 284 (1-3)Pages: 153-159 Publisher: Elsevier BV

DOI: 10.1016/s0022-3093(01)00395-7

Get Full-Text PDF Get Analytical Report

Keywords:

Amorphous solid Chemical vapor deposition Electron cyclotron resonance Carbon film Amorphous carbon Substrate (aquarium) Materials science Thin film Deposition (geology) Analytical Chemistry (journal) Chemical engineering Chemistry Crystallography Nanotechnology Organic chemistry Ion

Metrics

Cited By

0.47

FWCI (Field Weighted Citation Impact)

Refs

0.60

Citation Normalized Percentile

Is in top 1%

Is in top 10%

Citation History

Topics

Inorganic Fluorides and Related Compounds

Physical Sciences → Chemistry → Inorganic Chemistry

Luminescence Properties of Advanced Materials

Physical Sciences → Materials Science → Materials Chemistry

ZnO doping and properties

Physical Sciences → Materials Science → Materials Chemistry

Preparation of amorphous fluoride films by electron cyclotron resonance plasma-enhanced chemical vapor deposition

Metrics

Citation History

Topics

Related Documents

Nitrogenated amorphous carbon films synthesized by electron cyclotron resonance plasma enhanced chemical vapor deposition

Preparation of TiN Films by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition

Preparation of nitrogen containing carbon films using chemical vapor deposition enhanced by electron cyclotron resonance plasma

Silicon dioxide films deposited by electron cyclotron resonance plasma enhanced chemical vapor deposition

Preparation of Bismuth Titanate Films by Electron Cyclotron Resonance Plasma Sputtering-Chemical Vapor Deposition