Sputtered amorphous silicon thin films for diode laser crystallization

Gabriele Schmidl; G. Andrä; J. Bergmann; Annett Gawlik; I. Höger; Ingo Sill; Mathias Steglich; F. Falk; Günter Mayer

doi:10.1016/j.matlet.2011.09.084

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Sputtered amorphous silicon thin films for diode laser crystallization

Gabriele Schmidl G. Andrä J. Bergmann Annett Gawlik I. Höger Ingo Sill Mathias Steglich F. Falk Günter Mayer

Year: 2011 Journal: Materials Letters Vol: 67 (1)Pages: 229-232 Publisher: Elsevier BV

DOI: 10.1016/j.matlet.2011.09.084

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Keywords:

Materials science Amorphous silicon Thin film Silicon Optoelectronics Amorphous solid Crystallization Sputtering Nanocrystalline silicon Sputter deposition Laser diode Laser Diode Plasma-enhanced chemical vapor deposition Thin-film transistor Evaporation Crystalline silicon Optics Composite material Nanotechnology Chemical engineering Crystallography Layer (electronics)

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Thin-Film Transistor Technologies

Physical Sciences → Engineering → Electrical and Electronic Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Laser Material Processing Techniques

Physical Sciences → Engineering → Computational Mechanics

Sputtered amorphous silicon thin films for diode laser crystallization

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