Crystallization and decomposition of co-sputtered amorphous silicon-aluminum thin films

Toyohiko J. Konno; Robert Sinclair

doi:10.1016/0254-0584(93)90183-m

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Crystallization and decomposition of co-sputtered amorphous silicon-aluminum thin films

Toyohiko J. Konno Robert Sinclair

Year: 1993 Journal: Materials Chemistry and Physics Vol: 35 (2)Pages: 99-113 Publisher: Elsevier BV

DOI: 10.1016/0254-0584(93)90183-m

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Keywords:

Crystallization Materials science Amorphous solid Silicon Amorphous silicon Thin film Aluminium Decomposition Chemical engineering Metallurgy Crystallography Nanotechnology Chemistry Crystalline silicon Organic chemistry

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Metallic Glasses and Amorphous Alloys

Physical Sciences → Engineering → Mechanical Engineering

Silicon Nanostructures and Photoluminescence

Physical Sciences → Materials Science → Materials Chemistry

Semiconductor materials and interfaces

Physical Sciences → Physics and Astronomy → Atomic and Molecular Physics, and Optics

Crystallization and decomposition of co-sputtered amorphous silicon-aluminum thin films

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