A new method of manufacturing high aspect ratio structures using SU8 negative photoresist

Saydulla Persheyev; Mervyn Rose

doi:10.1557/proc-1272-kk09-07

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A new method of manufacturing high aspect ratio structures using SU8 negative photoresist

Saydulla Persheyev Mervyn Rose

Year: 2010 Journal: MRS Proceedings Vol: 1272 Publisher: Cambridge University Press

DOI: 10.1557/proc-1272-kk09-07

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Keywords:

Photoresist Materials science Microelectromechanical systems Epoxy Dry etching Electronics Nanotechnology Etching (microfabrication) Dielectric Plasma Optoelectronics Composite material Electrical engineering

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Nanofabrication and Lithography Techniques

Physical Sciences → Engineering → Biomedical Engineering

Advancements in Photolithography Techniques

Physical Sciences → Engineering → Electrical and Electronic Engineering

Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

A new method of manufacturing high aspect ratio structures using SU8 negative photoresist

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