JOURNAL ARTICLE

A new method of manufacturing high aspect ratio structures using SU8 negative photoresist

Saydulla PersheyevMervyn Rose

Year: 2010 Journal:   MRS Proceedings Vol: 1272   Publisher: Cambridge University Press
Keywords:
Photoresist Materials science Microelectromechanical systems Epoxy Dry etching Electronics Nanotechnology Etching (microfabrication) Dielectric Plasma Optoelectronics Composite material Electrical engineering

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Cited By
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FWCI (Field Weighted Citation Impact)
11
Refs
0.13
Citation Normalized Percentile
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Citation History

Topics

Nanofabrication and Lithography Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
Advancements in Photolithography Techniques
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Semiconductor materials and devices
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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