JOURNAL ARTICLE

A novel method to overcome photoresist collapse with high aspect ratio structures

Mingyan YuShirui ZhaoChaoqun GaoXiaolong GuoXinwei XuYunbo ShiYupeng JingBaoqin Chen

Year: 2013 Journal:   Microsystem Technologies Vol: 20 (12)Pages: 2185-2189   Publisher: Springer Science+Business Media
Keywords:
Photoresist Aspect ratio (aeronautics) Resist Materials science Lithography Surface tension Electron-beam lithography Cathode ray Carbon nanotube Optoelectronics Optics Nanotechnology Composite material Electron Physics

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14
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0.08
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Citation History

Topics

Electrowetting and Microfluidic Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering
Nanofabrication and Lithography Techniques
Physical Sciences →  Engineering →  Biomedical Engineering
Electronic Packaging and Soldering Technologies
Physical Sciences →  Engineering →  Electrical and Electronic Engineering

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