Cold plasmas in reactive physical and chemical vapour deposition processes

Abstract

Abstract Progress in plasma chemistry and plasma physics set up possibilities to fabricate high quality compound films for various applications by low‐temperatur PVD and CVD techniques. Industrial ion platting processes for the production of wear resistant coatings on tools and machine parts and of hard and stabile optical coatings as well as a plasma polymerization process for the production of protective coatings on plastics are described.