BOOK-CHAPTER

Remote Plasmas Chemical Vapour Deposition and Reactive Sputtering in Magnetron Plasmas

Keywords:
Plasma High-power impulse magnetron sputtering Sputtering Sputter deposition Materials science Deposition (geology) Cavity magnetron Nanotechnology Physics Thin film Nuclear physics Geology

Metrics

0
Cited By
0.00
FWCI (Field Weighted Citation Impact)
0
Refs
0.18
Citation Normalized Percentile
Is in top 1%
Is in top 10%

Topics

nanoparticles nucleation surface interactions
Physical Sciences →  Earth and Planetary Sciences →  Atmospheric Science
Metal and Thin Film Mechanics
Physical Sciences →  Engineering →  Mechanics of Materials
Laser-induced spectroscopy and plasma
Physical Sciences →  Engineering →  Mechanics of Materials

Related Documents

BOOK-CHAPTER

Remote Plasmas CVD and Reactive Sputtering in Magnetron Plasmas

A. RicardT. BelmonteT. CzerwiecStéphanos Konstantinidis

Book Publisher International (a part of SCIENCEDOMAIN International) Year: 2022 Pages: 155-168
JOURNAL ARTICLE

Cold plasmas in reactive physical and chemical vapour deposition processes

H.K. Pulker

Journal:   Vakuum in Forschung und Praxis Year: 1992 Vol: 4 (4)Pages: 277-284
JOURNAL ARTICLE

Modeling of magnetron sputtering plasmas

C.H. ShonJ.K Lee

Journal:   Applied Surface Science Year: 2002 Vol: 192 (1-4)Pages: 258-269
JOURNAL ARTICLE

Magnetron plasmas for large-area uniform sputtering

Hiroshi FujiyamaK. Kuwahara

Journal:   Surface and Coatings Technology Year: 1995 Vol: 74-75 Pages: 75-79
© 2026 ScienceGate Book Chapters — All rights reserved.