Microstructure and corrosion resistance of room-temperature RF sputtered Ta2O5 thin films

A. K. Chu; M.J. Chuang; K. Y. Hsieh; Heng‐Li Huang; Yang Yu; C. W. Wang; E. K. Lin

doi:10.1007/s11664-999-0141-8

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Microstructure and corrosion resistance of room-temperature RF sputtered Ta2O5 thin films

A. K. Chu M.J. Chuang K. Y. Hsieh Heng‐Li Huang Yang Yu C. W. Wang E. K. Lin

Year: 1999 Journal: Journal of Electronic Materials Vol: 28 (12)Pages: 1457-1460 Publisher: Springer Science+Business Media

DOI: 10.1007/s11664-999-0141-8

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Keywords:

Microstructure Corrosion Materials science Amorphous solid Thin film Sputtering Sputter deposition RF power amplifier Composite material Porosity Metallurgy Optoelectronics Nanotechnology Chemistry Crystallography

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Semiconductor materials and devices

Physical Sciences → Engineering → Electrical and Electronic Engineering

Copper Interconnects and Reliability

Physical Sciences → Materials Science → Electronic, Optical and Magnetic Materials

Metal and Thin Film Mechanics

Physical Sciences → Engineering → Mechanics of Materials

Microstructure and corrosion resistance of room-temperature RF sputtered Ta2O5 thin films

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